Nonthermal plasma chemistry and physics
著者
書誌事項
Nonthermal plasma chemistry and physics
CRC Press, c2013
- : hardback
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注記
Other authors: Martin Schmidt, Ralf schneider, Hans-Erich Wagner
Includes bibliographical references (p. 473-538) and index
内容説明・目次
内容説明
In addition to introducing the basics of plasma physics, Nonthermal Plasma Chemistry and Physics is a comprehensive presentation of recent developments in the rapidly growing field of nonthermal plasma chemistry. The book offers a detailed discussion of the fundamentals of plasma chemical reactions and modeling, nonthermal plasma sources, relevant diagnostic techniques, and selected applications.
Elucidating interconnections and trends, the book focuses on basic principles and illustrations across a broad field of applications. Expert contributors address environmental aspects of plasma chemistry. The book also includes selected plasma conditions and specific applications in volume plasma chemistry and treatment of material surfaces such as plasma etching in microelectronics, chemical modification of polymer surfaces and deposition of functional thin films. Designed for students of plasma physics, Nonthermal Plasma Chemistry and Physics is a concise resource also for specialists in this and related fields of research.
目次
Introduction. Nonthermal Plasma Chemical Processes of General Interest. Physics of Nonthermal Plasmas. Nonthermal Plasma Chemical Reactors. Elementary Processes on Surfaces in Plasma-Wall Interaction. Plasma Diagnostics. Surface and Thin Film Analysis. Selected Applications. Modeling and Simulation. Trends and New Concepts.
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