Film silicon science and technology : symposium held April 1-5, 2013, San Francisco, California U.S.A.
著者
書誌事項
Film silicon science and technology : symposium held April 1-5, 2013, San Francisco, California U.S.A.
（Materials Research Society symposium proceedings, v. 1536）
Materials Research Society , Cambridge University Press, 2013
- : hbk.
大学図書館所蔵 全1件
注記
Includes bibliographical references and indexes
内容説明・目次
内容説明
Symposium A, 'Film Silicon Science and Technology', was held April 1-5, 2013 at the 2013 MRS Spring Meeting in San Francisco, California.
目次
- Part I. Thin Film Silicon Solar Cells: 1. Light management using periodic textures for enhancing photocurrent and conversion efficiency in thin-film silicon solar cells
- 2. Panasonic's thin film silicon technologies for advanced photovoltaics
- 3. Hydrogen-plasma etching of thin amorphous silicon layers for heterojunction interdigitated back-contact solar cells
- 4. Employing lc-SiOX:H as n-type layer and back TCO replacement for high-efficiency a-Si:H/lc-Si:H tandem solar cells
- 5. A vertical PN junction utilizing the impurity photovoltaic effect for the enhancement of ultra-thin film silicon solar cells
- 6. Impact on thin film silicon properties and solar cell parameters of texture generated by laser annealing and chemical etching of ZnO:Al
- 7. Novel intermediate reflector layer for optical and morphological tuning in the micromorph thin film tandem cell
- 8. Development of nanocrystalline silicon based multi-junction solar cell technology for high volume manufacturing
- 9. SnO2:F with very high haze value and transmittance in near infrared wavelength for use as front transparent conductive oxide films in thin-film silicon solar cells
- Part II. Novel Silicon-Based Devices and Solar Cells: 10. Amorphous silicon based betavoltaic devices
- 11. SiC monolithically integrated wavelength selector with 4 channels
- 12. Design of an optical transmission WDM link using plastic optical fibers
- 13. Optoelectronic logic functions using optical bias controlled SiC multilayer devices
- 14. Improvement of seed layer smoothness for epitaxial growth on porous silicon
- Part III. Materials and Devices Characterization and Simulation: 15. Local junction voltages and radiative ideality factors of a-Si:H solar modules determined by electroluminescence imaging
- 16. The dependence of the crystalline volume fraction on the crystallite size for hydrogenated nanocrystalline silicon based solar cells
- 17. Carrier lifetime measurements by photoconductance at low temperature on passivated crystalline silicon wafers
- 18. Characterization of boron doped amorphous silicon films by multiple internal reflection infrared spectroscopy
- 19. Emission spectra study of plasma enhanced chemical vapor deposition of intrinsic, n1, and p1 amorphous silicon thin films
- 20. On the origin of the Urbach Rule and the Urbach Focus
- 21. Ultrafast optical measurements of acoustic phonon attenuation in amorphous and nanocrystalline silicon
- 22. Stress analysis of free-standing silicon oxide films using optical interference
- 23. Effect of RF or VHF plasma on nanocrystalline silicon thin film structure: insight from OES and Langmuir Probe measurements
- Part IV. Defects and Transport: 24. Defect densities and carrier lifetimes in oxygen doped nanocrystalline Si
- 25. Microstructure characterization of amorphous silicon films by effusion measurements of implanted helium
- 26. Temperature dependence of 1/f noise and electrical conductivity measurements on p-type a-Si:H devices
- 27. Study of surface passivation of CZ c-Si by PECVD a-Si:H films: a comparison between quasi-steady-state and transient photoconductance decay measurement
- Part V. Nanostructured Silicon and Related Novel Materials: 28. Charge transport in nanocrystalline germanium/hydrogenated amorphous silicon mixed-phase thin films
- 29. Low temperature annealing of inkjet-printed silicon thin-films for photovoltaic and thermoelectric devices
- 30. Shape evolution of faceted silicon nanocrystals upon thermal annealing in an oxide matrix
- 31. Crystallization kinetics of plasma-produced amorphous silicon nanoparticles.
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