Subsecond annealing of advanced materials : annealing by lasers, flash lamps and swift heavy ions

著者

書誌事項

Subsecond annealing of advanced materials : annealing by lasers, flash lamps and swift heavy ions

Wolfgang Skorupa, Heidemarie Schmidt, editors

(Springer series in materials science, 192)

Springer, c2014

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注記

Includes bibliographical references and index

内容説明・目次

内容説明

The thermal processing of materials ranges from few fem to seconds by Swift Heavy Ion Implantation to about one second using advanced Rapid Thermal Annealing. This book offers after an historical excursus selected contributions on fundamental and applied aspects of thermal processing of classical elemental semiconductors and other advanced materials including nanostructures with novel optoelectronic, magnetic, and superconducting properties. Special emphasis is given on the diffusion and segregation of impurity atoms during thermal treatment. A broad range of examples describes the solid phase and/or liquid phase processing of elemental and compound semiconductors, dielectric composites and organic materials.

目次

The very early time.- Nanonet formation by constitutional supercooling of pulsed laser annealed, Mn-implanted germanium.- Metastable activation of dopants by solid phase epitaxial recrystallization.- Superconducting Ga-implanted Germanium.- Structural changes in SiGe/Si layers induced by fast crystallization.- Sub-nanosecond thermal spike-induced nanostructuring of thin solid films under swift heavy-ion (SHI) irradiation.- Pulsed-laser-induced epitaxial growth of silicon for three-dimensional integrated circuits.- Improvement of performance and cost of functional films using large area laser RTP.- Pulsed laser dopant activation for semiconductors and solar cells.- Formation of high-quality m-order-thick poly-Si films on glass substrates by flash lamp annealing.- Millisecond-range liquid-phase processing of silicon-based hetero-nanostructures.- Radiation thermometry - sources of uncertainty during contactless temperature measurement.- Millisecond annealing for semiconductor device applications.- Low-cost and large-area electronics, roll-to-roll processing and beyond.- Application of sub-second annealing for dilute ferromagnetic semiconductors.

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詳細情報

  • NII書誌ID(NCID)
    BB14670749
  • ISBN
    • 9783319031309
  • LCCN
    2013957144
  • 出版国コード
    sz
  • タイトル言語コード
    eng
  • 本文言語コード
    eng
  • 出版地
    Cham
  • ページ数/冊数
    xvii, 321 p.
  • 大きさ
    25 cm
  • 親書誌ID
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