Some aspects of dose measurement for accurate ion implantation

著者

    • Jamba, Douglas M.

書誌事項

Some aspects of dose measurement for accurate ion implantation

Douglas M. Jamba

(NBS special publication, 400-39 . Semiconductor measurement technology)

U.S. G.P.O., 1977

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注記

Bibliography: p. 36

関連文献: 1件中  1-1を表示

  • NBS special publication

    Planning Office, National Bureau of Standards, U.S. Dept. of Commerce , For sale by the Supt. of Docs., U.S. Govt. Print. Off

    426, Suppl. 1

    所蔵館1館

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