3D process technology

著者

• Garrou, Philip E.
• Koyanagi, Mitsumasa
• Ramm, Peter

書誌事項

3D process technology

edited by Philip Garrou, Mitsumasa Koyanagi and Peter Ramm

（Handbook of 3D integration, v. 3）

Wiley-VCH, c2014

• hbk.

注記

Includes bibliographical references and index

内容説明・目次

内容説明

Edited by key figures in 3D integration and written by top authors from high-tech companies and renowned research institutions, this book covers the intricate details of 3D process technology. As such, the main focus is on silicon via formation, bonding and debonding, thinning, via reveal and backside processing, both from a technological and a materials science perspective. The last part of the book is concerned with assessing and enhancing the reliability of the 3D integrated devices, which is a prerequisite for the large-scale implementation of this emerging technology. Invaluable reading for materials scientists, semiconductor physicists, and those working in the semiconductor industry, as well as IT and electrical engineers.

目次

3D IC INTEGRATION SINCE 2008 3D IC Nomenclature Process Standardization The Introduction of Interposers (2.5D) The Foundries Memory The Assembly and Test Houses 3D IC Application Roadmaps KEY APPLICATIONS AND MARKED TRENDS FOR 3D INTEGRATION AND INTERPOSER TECHNOLOGIES Introduction Advanced Packaging Importance in the Semiconductor Industry is Growing 3D Integration-Focused Activities - The Global IP Landscape Applications, Technology, and Market Trends ECONOMIC DRIVERS AND IMPEDIMENTS FOR 2.5D/3D INTEGRATION 3D Performance Advantages The Economics of Scaling The Cost of Future Scaling Cost Remains the Impediment to 2.5D and 3D Product Introduction INTERPOSER TECHNOLOGY Definition of 2.5D Interposers Interposer Drivers and Need Comparison of Interposer Materials Silicon Interposers with TSV Lower Cost Interposers Interposer Technical and Manufacturing Challenges Interposer Application Examples Conclusions TSV FORMATION OVERVIEW Introduction TSV Process Approaches TSV Fabrication Steps Yield and Reliability TSV UNIT PROCESSES AND INTEGRATION Introduction TSV Process Overview TSV Unit Processes Integration and Co-Optimization of Unit Processes in Via Formation Sequence Co-Optimization of Unit Processes in Backside Processing and Via-Reveal Flow Integration and Co-Optimization of Unit Processes in Via-Last Flow Integration with Packaging Electrical Characterization of TSVs Conclusions TSV FORMATION AT ASET Introduction Via-Last TSV for Both D2D and W2W Processes in ASET TSV Process for D2D TSV Process for W2W Conclusions LASER-ASSISTED WAFER PROCESSING: NEW PERSPECTIVES IN THROUGH-SUBSTRATE VIA DRILLING AND REDISTRIBUTION LAYER DEPOSITION Introduction Laser Drilling of TSVs Direct-Write Deposition of Redistribution Layers Conclusions and Outlook TEMPORARY BONDING MATERIAL REQUIREMENTS Introduction Technology Options Requirements of a Temporary Bonding Material Considerations for Successful Processing Surviving the Backside Process Debonding TEMPORARY BONDING AND DEBONDING - AN UPDATE ON MATERIALS AND METHODS Introduction Carrier Selection for Temporary Bonding Selection of Temporary Bonding Adhesives Bonding and Debonding Processes Equipment and Process Integration ZONEBOND (R): RECENT DEVELOPMENTS IN TEMPORARY BONDING AND ROOM-TEMPERATURE DEBONDING Introduction Thin Wafer Processing ZoneBOND Room-Temperature Debonding Conclusions TEMPORARY BONDING AND DEBONDING AT TOK Introduction Zero Newton Technology Conclusions THE 3M (TM) WAFER SUPPORT SYSTEM (WSS) Introduction System Description General Advantages High-Temperature Material Solutions Process Considerations Future Directions Summary COMPARISON OF TEMPORARY BONDING AND DEBONDING PROCESS FLOWS Introduction Studies of Wafer Bonding and Thinning Backside Processing Debonding and Cleaning THINNING, VIA REVEAL, AND BACKSIDE PROCESSING - OVERVIEW Introduction Wafer Edge Trimming Thin Wafer Support Systems Wafer Thinning Thin Wafer Backside Processing BACKSIDE THINNING AND STRESS-RELIEF TECHNIQUES FOR THIN SILICON WAFERS Introduction Thin Semiconductor Devices Wafer Thinning Techniques Fracture Tests for Thin Silicon Wafers Comparison of Stress-Relief Techniques for Wafer Backside Thinning Process Flow for Wafer Thinning and Dicing Summary and Outlook on 3D Integration VIA REVEAL AND BACKSIDE PROCESSING Introduction Via Reveal and Backside Processing in Via-Middle Process Backside Processing in Back-Via Process Backside Processing and Impurity Gettering Backside Processing for RDL Formation DICING, GRINDING, AND POLISHING (KIRU KEZURU AND MIGAKU) Introduction Grinding and Polishing Dicing Summary OVERVIEW OF BONDING AND ASSEMBLY FOR 3D INTEGRATION Introduction Direct, Indirect, and Hybrid Bonding Requirements for Bonding Process and Materials Bonding Quality Characterization Discussion of Specific Bonding and Assembly Technologies Summary and Conclusions BONDING AND ASSEMBLY AT TSMC Introduction Process Flow Chip-on-Wafer Stacking CoW-on-Substrate (CoWoS) Stacking CoWoS Versus CoCoS Testing and Known Good Stacks (KGS) Future Perspectives TSV PACKAGING DEVELOPMENT AT STATS ChipPAC Introduction Development of the 3DTSV Solution for Mobile Platforms Alternative Approaches and Future Developments CU-SIO2 HYBRID BONDING Introduction Blanket Cu-SiO2 Direct Bonding Principle Chemical-Mechanical Polishing Parameters Aligned Bonding Blanket Metal Direct Bonding Principle Electrical Characterization Conclusions BUMP INTERCONNECT FOR 2:5D AND 3D INTEGRATION History C4 Solder Bumps Copper Pillar Bumps Cu Bumps Electromigration SELF-ASSEMBLY BASED 3D AND HETEROINTEGRATION Introduction Self-Assembly Process Key Parameters of Self-Assembly on Alignment Accuracies How to Interconnect Self-Assembled Chips to Chips or Wafers Flip-Chip-to-Wafer 3D Integration Reconfigured-Wafer-to-Wafer 3D Integration HIGH-ACCURACY SELF-ALIGNMENT OF THIN SILICON DIES ON PLASMA-PROGRAMMED SURFACES Introduction Principle of Fluidic Self-Alignment Process for Thin Dies Plasma Programming of the Surface Preparation of Materials for Self-Alignment Experiments Self-Alignment Experiments Results of Self-Alignment Experiments Discussion Conclusions CHALLENGES IN 3D FABRICATION Introduction High-Volume Manufacturing for 3D Integration Technology Challenges Front-Side and Backside Wafer Processes Bonding and Underfills Multitier Stacking Wafer Thinning and Thin Die and Wafer Handling Strata Packaging and Assembly Yield Management Reliability Cost Management Future Perspectives CU TSV STRESS: AVOIDING CU PROTRUSION AND IMPACT ON DEVICES Introduction Cu Stress in TSV Mitigation of Cu Pumping Impact of TSVs on FEOL Devices IMPLICATIONS OF STRESS/STRAIN AND METAL CONTAMINATION ON THINNED DIE Introduction Impacts of Cu Contamination on Device Reliabilities in Thinned 3DLSI Impacts of Local Stress and Strain on Device Reliabilities in Thinned 3DLSI METROLOGY NEEDS FOR 2.5D/3D INTERCONNECTS Introduction: 2.5D and 3D Reference Flows TSV Formation MEOL Metrology Assembly and Packaging Metrology Summary Index

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詳細情報

• NII書誌ID(NCID): BB18909379
• ISBN:
  • 9783527334667
• 出版国コード: gw
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Weinheim, Germany
• ページ数/冊数: xxii, 451 p.
• 大きさ: 26 cm
• 分類:
  • DC23 : 621.3815
• 件名:
  • LCSH : Integrated circuits
  • LCSH : Integrated circuits -- Design and construction
  • LCSH : Silicon
  • LCSH : Three-dimensional imaging
• 親書誌ID:
  • BB18909233