Development of hydrogen and hydroxyl contamination in thin silicon dioxide thermal films

Author(s)

• Mayo, Santos
• Evans, William H.

Bibliographic Information

Development of hydrogen and hydroxyl contamination in thin silicon dioxide thermal films

Santos Mayo and William H. Evans

（NBSIR, 78-1558）

U.S. Dept. of Commerce, National Bureau of Standards, 1979

Note

Includes bibliographical references

Details

• NCID: BB19067733
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: [Washington, D.C.]
• Pages/Volumes: iv, 34 p.
• Size: 27 cm
• Parent Bibliography ID:
  • BA4848735X