書誌事項

Basic geometrical optics

Peter Hawkes, Erwin Kasper

(Principles of electron optics, v. 1)

Elsevier , Academic Press, c2018

2nd ed

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注記

Notes and references : p. 627-707

Includes index

内容説明・目次

内容説明

Volume one of Principles of Electron Optics: Basic Geometrical Optics, Second Edition, explores the geometrical optics needed to analyze an extremely wide range of instruments: cathode-ray tubes; the family of electron microscopes, including the fixed-beam and scanning transmission instruments, the scanning electron microscope and the emission microscope; electron spectrometers and mass spectrograph; image converters; electron interferometers and diffraction devices; electron welding machines; and electron-beam lithography devices. The book provides a self-contained, detailed, modern account of electron optics for anyone involved with particle beams of modest current density in the energy range up to a few mega-electronvolts. You will find all the basic equations with their derivations, recent ideas concerning aberration studies, extensive discussion of the numerical methods needed to calculate the properties of specific systems and guidance to the literature of all the topics covered. A continuation of these topics can be found in volume two, Principles of Electron Optics: Applied Geometrical Optics. The book is intended for postgraduate students and teachers in physics and electron optics, as well as researchers and scientists in academia and industry working in the field of electron optics, electron and ion microscopy and nanolithography.

目次

1. Introduction PART I – CLASSICAL MECHANICS 2. Relativistic Kinematics 3. Different Forms of Trajectory Equations 4. Variational Principles 5. Hamiltonian Optics PART II – CALCULATION OF STATIC FIELDS 6. Basic Concepts and Equations 7. Series Expansions 8. Boundary-Value Problems 9. Integral Equations 10. The Boundary-Element Method 11. The Finite-Difference Method (FDM) 12. The Finite-Element Method (FEM) 13. Field-Interpolation Techniques PART III – THE PARAXIAL APPROXIMATION 14. Introduction 15. Systems with an Axis of Rotational Symmetry 16. Gaussian Optics of Rotationally Symmetric Systems: Asymptotic Image Formation 17. Gaussian Optics of Rotationally Symmetric Systems: Real Cardinal Elements 18. Electron Mirrors 19. Quadrupole Lenses 20. Cylindrical Lenses PART IV – ABERRATIONS 21. Introduction 22. Perturbation Theory: General Formalism 23. The Relation Between Permitted Types of Aberration and System Symmetry 24. The Geometrical Aberrations of Round Lenses 25. Asymptotic Aberration Coefficients 26. Chromatic Aberrations 27. Aberration Matrices and the Aberrations of Lens Combinations 28. The Aberrations of Mirrors and Cathode Lenses 29. The Aberrations of Quadrupole Lenses and Octopoles 30. The Aberrations of Cylindrical Lenses 31. Parasitic Aberrations PART V – DEFLECTION SYSTEMS 32. Paraxial Properties of Deflection Systems 33. The Aberrations of Deflection Systems PART VI – COMPUTER-AIDED ELECTRON OPTICS 34. Numerical Calculation of Trajectories, Paraxial Properties and Aberrations

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詳細情報

  • NII書誌ID(NCID)
    BB25002470
  • ISBN
    • 9780081022566
  • 出版国コード
    ne
  • タイトル言語コード
    eng
  • 本文言語コード
    eng
  • 出版地
    [Amsterdam],London
  • ページ数/冊数
    xix, 707 p.
  • 大きさ
    24 cm
  • 分類
  • 件名
  • 親書誌ID
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