Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA

著者

• Houlihan, Francis M.
• Annual SPIE Cconference on Advances in Resist Ttechnology and Processing
• Society of Photo-optical Instrumentation Engineers
• Semiconductor Equipment and Materials International
• International SEMATECH

書誌事項

Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA

Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 4345）

SPIE, c2001

• : set
• pt. 1
• pt. 2

タイトル別名

Advances in resist technology and processing 18

注記

Includes bibliographical references and author index

詳細情報

• NII書誌ID(NCID): BB29368259
• ISBN:
  • 0819440310
• LCCN: 2002283519
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Washington
• ページ数/冊数: 2 v. (xxix, 1084 p.)
• 大きさ: 28 cm
• 分類:
  • LCC : TR940
  • DC21 : 621.3815/31
• 件名:
  • LCSH : Photoresists -- Congresses
  • LCSH : Microlithography -- Congresses
• 親書誌ID:
  • BA0022700X