Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA

Author(s)

• Houlihan, Francis M.
• Annual SPIE Cconference on Advances in Resist Ttechnology and Processing
• Society of Photo-optical Instrumentation Engineers
• Semiconductor Equipment and Materials International
• International SEMATECH

Bibliographic Information

Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA

Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 4345）

SPIE, c2001

• : set
• pt. 1
• pt. 2

Other Title

Advances in resist technology and processing 18

Note

Includes bibliographical references and author index

• NCID: BB29368259
• ISBN:
  • 0819440310
• LCCN: 2002283519
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Washington
• Pages/Volumes: 2 v. (xxix, 1084 p.)
• Size: 28 cm
• Classification:
  • LCC : TR940
  • DC21 : 621.3815/31
• Subject Headings:
  • LCSH : Photoresists -- Congresses
  • LCSH : Microlithography -- Congresses
• Parent Bibliography ID:
  • BA0022700X