Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA

Author(s)

Bibliographic Information

Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA

Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH

(Proceedings / SPIE -- the International Society for Optical Engineering, v. 4345)

SPIE, c2001

  • : set
  • pt. 1
  • pt. 2

Other Title

Advances in resist technology and processing 18

Available at  / 1 libraries

Search this Book/Journal

Note

Includes bibliographical references and author index

Related Books: 1-1 of 1

  • Proceedings

    SPIE -- the International Society for Optical Engineering

    SPIE -- the International Society for Optical Engineering

Details

Page Top