Emerging lithographic technologies XI : 27 February-1 March 2007, San Jose, California, USA

著者

• Emerging Lithographic Technologies
• Lercel, Michael J.
• Society of Photo-optical Instrumentation Engineers
• SEMATECH

書誌事項

Emerging lithographic technologies XI : 27 February-1 March 2007, San Jose, California, USA

Michael J. Lercel, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 6517）

SPIE, c2007

• : pt. 1

タイトル別名

Emerging lithographic technologies 11

Emerging lithographic technologies eleven

注記

Includes bibliographical references and author index

"Part One of Two Parts"--T.p.

詳細情報

• NII書誌ID(NCID): BC02139666
• LCCN: 2009284503
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash.
• ページ数/冊数: 1 v. (various pagings)
• 大きさ: 28 cm
• 分類:
  • LCC : TK7874
• 件名:
  • LCSH : Lithography, Electron beam -- Congresses
  • LCSH : Microlithography -- Industrial applications -- Congresses
  • LCSH : X-ray lithography -- Congresses
  • LCSH : X-rays -- Industrial applications -- Congresses
  • LCSH : Masks (Electronics) -- Congresses
• 親書誌ID:
  • BA0022700X