Emerging lithographic technologies XI : 27 February-1 March 2007, San Jose, California, USA

Author(s)

• Emerging Lithographic Technologies
• Lercel, Michael J.
• Society of Photo-optical Instrumentation Engineers
• SEMATECH

Bibliographic Information

Emerging lithographic technologies XI : 27 February-1 March 2007, San Jose, California, USA

Michael J. Lercel, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 6517）

SPIE, c2007

• : pt. 2

Other Title

Emerging lithographic technologies 11

Emerging lithographic technologies eleven

Note

Includes bibliographical references and author index

"Part Two of Two Parts"--T.p.

Details

• NCID: BC02139906
• LCCN: 2009284503
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash.
• Pages/Volumes: 1 v. (various pagings)
• Size: 28 cm
• Classification:
  • LCC : TK7874
• Subject Headings:
  • LCSH : Lithography, Electron beam -- Congresses
  • LCSH : Microlithography -- Industrial applications -- Congresses
  • LCSH : X-ray lithography -- Congresses
  • LCSH : X-rays -- Industrial applications -- Congresses
  • LCSH : Masks (Electronics) -- Congresses
• Parent Bibliography ID:
  • BA0022700X