Optical microlithography XX : 27 February-2 March 2007, San Jose, California, USA

著者

• Optical Microlithography
• Flagello, Donis G.
• Society of Photo-optical Instrumentation Engineers
• SEMATECH

書誌事項

Optical microlithography XX : 27 February-2 March 2007, San Jose, California, USA

Donis G. Flagello, editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH Inc.

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 6520）

SPIE, c2007

• : pt. 1

タイトル別名

Optical microlithography 20

Optical microlithography twenty

注記

Includes bibliographical references and author index

"Part One of Three Parts"--T.p.

詳細情報

• NII書誌ID(NCID): BC02331492
• LCCN: 2010459315
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash.
• ページ数/冊数: 1 v. (various pagings)
• 大きさ: 28 cm
• 分類:
  • LCC : TR940
  • DC22 : 621.3815/31
• 件名:
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : Microlithography -- Congresses
  • LCSH : X-ray lithography -- Congresses
  • LCSH : Manufacturing processes -- Congresses
• 親書誌ID:
  • BA0022700X