EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France

Author(s)

• European Mask and Lithography Conference
• Behringer, Uwe F. W.
• VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik
• CEA-LETI
• Society of Photo-optical Instrumentation Engineers

Bibliographic Information

EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France

Uwe F.W. Behringer, chair/editor ; organized by VDE/VDI GMM--the Society for Microelectronics, Micro- and Precision Engineering (Germany) ; cooperating organizations, CEA-LETI (France) ... [et al.] ; published by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 6533）

SPIE, c2007

Other Title

Twenty third European mask and lithography conference

Note

Includes bibliographical references and author index

Description and Table of Contents

Description

Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

by "Nielsen BookData"

Details

• NCID: BC02384761
• ISBN:
  • 9780819466556
• LCCN: 2007299339
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash.,
• Pages/Volumes: 1 v. (various pagings)
• Size: 28 cm
• Classification:
  • LCC : TK7872.M3
  • DC22 : 621.3815/31
• Subject Headings:
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : Microlithography -- Congresses
• Parent Bibliography ID:
  • BA0022700X