Epitaxial growth of III-nitride compounds : computational approach

著者

    • Matsuoka, Takashi
    • Kangawa, Yoshihiro

書誌事項

Epitaxial growth of III-nitride compounds : computational approach

Takashi Matsuoka, Yoshihiro Kangawa, editors

(Springer series in materials science, 269)

Springer, c2018

  • : pbk.

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注記

Includes bibliographical references and index

"Softcover re-print of the Hardcover 1st edition 2018" -- T.p. verso

内容説明・目次

内容説明

This book presents extensive information on the mechanisms of epitaxial growth in III-nitride compounds, drawing on a state-of-the-art computational approach that combines ab initio calculations, empirical interatomic potentials, and Monte Carlo simulations to do so. It discusses important theoretical aspects of surface structures and elemental growth processes during the epitaxial growth of III-nitride compounds. In addition, it discusses advanced fundamental structural and electronic properties, surface structures, fundamental growth processes and novel behavior of thin films in III-nitride semiconductors. As such, it will appeal to all researchers, engineers and graduate students seeking detailed information on crystal growth and its application to III-nitride compounds.

目次

1. Introduction 2. Computational methods 2.1 Ab initio calculations 2.2 Empirical interatomic potentials 2.3 Monte Carlo simulations 3. Fundamental properties of III-nitrides 3.1 Crystal structure 3.2 Band structure 3.3 Miscibility (InGaN and etc.) 3.4 Dislocation core structure 4. Growth processes 4.1 GaN 4.1.1 Surface structures 4.1.2 Adsorption-desorption behavior 4.1.3 Fundamental growth processes 4.1.4 Doping 4.1.5 Polarity dependence (nonpolar & semipolar orientations) 4.2 InN 4.2.1 Surface structures 4.2.2 Adsorption-desorption behavior 4.2.3 Fundamental growth processes 4.2.4 Polarity dependence (nonpolar & semipolar orientations) 4.3 AlN 4.3.1 Surface structures 4.3.2 Adsorption-desorption behavior 4.3.3 Fundamental growth processes 4.3.4 Polarity depend ence (nonpolar & semipolar orientations) 4.4 InGaN 4.4.1 Surface structures 4.4.2 Adsorption-desorption behavior 4.4.3 Fundamental growth processes 4.4.5 Polarity dependence (nonpolar & semipolar orientations) 4.5 Nitridation 5. Novel behaviour of thin films 5.1 Structural metastability (4H-AlN on SiC, c-GaN) 5.2 Segregation (InGaN, GaNAs) 5.3 Dislocation formation 5.4 Epitaxial relationship 6. Summary

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詳細情報

  • NII書誌ID(NCID)
    BC05831811
  • ISBN
    • 9783030095420
  • 出版国コード
    sz
  • タイトル言語コード
    eng
  • 本文言語コード
    eng
  • 出版地
    Cham
  • ページ数/冊数
    ix, 223 p.
  • 大きさ
    24 cm
  • 親書誌ID
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