Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California
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Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California
(Proceedings / SPIE -- the International Society for Optical Engineering, v. 2437)
SPIE, c1995
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Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing 5
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Includes bibliographical references and index