Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California

Author(s)

• Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing Symposium
• Warlaumont, John M.
• Society of Photo-optical Instrumentation Engineers
• Semiconductor Equipment and Materials International

Bibliographic Information

Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California

John M. Warlaumont, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 2437）

SPIE, c1995

Other Title

Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing 5

Note

Includes bibliographical references and index

Details

• NCID: BC06573165
• ISBN:
  • 0819417858
• LCCN: 94069900
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash., USA
• Pages/Volumes: vii, 450 p.
• Size: 28 cm.; jf08 12-18-95 to SL
• Classification:
  • LCC : TK7874
  • DC20 : 621.3815/31
• Subject Headings:
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : Extreme ultraviolet lithography -- Congresses
  • LCSH : Lithography, Electron beam -- Congresses
  • LCSH : X-ray lithography -- Congresses
  • LCSH : Ion beam lithography -- Congresses
• Parent Bibliography ID:
  • BA0022700X