Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California

著者

• Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing Symposium
• Warlaumont, John M.
• Society of Photo-optical Instrumentation Engineers
• Semiconductor Equipment and Materials International

書誌事項

Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California

John M. Warlaumont, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 2437）

SPIE, c1995

タイトル別名

Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing 5

注記

Includes bibliographical references and index

• NII書誌ID(NCID): BC06573165
• ISBN:
  • 0819417858
• LCCN: 94069900
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash., USA
• ページ数/冊数: vii, 450 p.
• 大きさ: 28 cm.; jf08 12-18-95 to SL
• 分類:
  • LCC : TK7874
  • DC20 : 621.3815/31
• 件名:
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : Extreme ultraviolet lithography -- Congresses
  • LCSH : Lithography, Electron beam -- Congresses
  • LCSH : X-ray lithography -- Congresses
  • LCSH : Ion beam lithography -- Congresses
• 親書誌ID:
  • BA0022700X