Optical characterization techniques for high-performance microelectronic device manufacturing II : 25-26 October 1995, Austin, Texas

著者

• SPIE Advanced Lithography : Microelectronic Manufacturing : Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing
• Lowell, John
• Chen, Ray T.
• Mathur, Jagdish P.
• Society of Photo-optical Instrumentation Engineers

書誌事項

Optical characterization techniques for high-performance microelectronic device manufacturing II : 25-26 October 1995, Austin, Texas

John K. Lowell, Ray T. Chen, Jagdish P. Mathur, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 2638）

SPIE, c1995

タイトル別名

Optical characterization techniques for high-performance microelectronic device manufacturing 2

注記

Includes bibliographical references and index

• NII書誌ID(NCID): BC06604688
• ISBN:
  • 0819420042
• LCCN: 95070381
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash.
• ページ数/冊数: ix, 302 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7836
  • DC22 : 621.3815/2
• 件名:
  • LCSH : Integrated circuits industry -- Congresses
  • LCSH : Manufacturing processes -- Congresses
  • LCSH : Semiconductors -- Design and construction -- Congresses
  • LCSH : Integrated circuits -- Design and construction -- Congresses
  • LCSH : Semiconductors -- Testing -- Optical methods -- Congresses
  • LCSH : Optical detectors -- Congresses
• 親書誌ID:
  • BA0022700X