Optical characterization techniques for high-performance microelectronic device manufacturing II : 25-26 October 1995, Austin, Texas

Author(s)

• SPIE Advanced Lithography : Microelectronic Manufacturing : Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing
• Lowell, John
• Chen, Ray T.
• Mathur, Jagdish P.
• Society of Photo-optical Instrumentation Engineers

Bibliographic Information

Optical characterization techniques for high-performance microelectronic device manufacturing II : 25-26 October 1995, Austin, Texas

John K. Lowell, Ray T. Chen, Jagdish P. Mathur, chairs/editors ; sponsored and published by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 2638）

SPIE, c1995

Other Title

Optical characterization techniques for high-performance microelectronic device manufacturing 2

Note

Includes bibliographical references and index

Details

• NCID: BC06604688
• ISBN:
  • 0819420042
• LCCN: 95070381
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash.
• Pages/Volumes: ix, 302 p.
• Size: 28 cm
• Classification:
  • LCC : TK7836
  • DC22 : 621.3815/2
• Subject Headings:
  • LCSH : Integrated circuits industry -- Congresses
  • LCSH : Manufacturing processes -- Congresses
  • LCSH : Semiconductors -- Design and construction -- Congresses
  • LCSH : Integrated circuits -- Design and construction -- Congresses
  • LCSH : Semiconductors -- Testing -- Optical methods -- Congresses
  • LCSH : Optical detectors -- Congresses
• Parent Bibliography ID:
  • BA0022700X