Microlithography and metrology in micromachining II : 14-15 October, 1996, Austin, Texas

Author(s)

• Microlithography and Metrology in Micromachining (Symposium)
• Postek, Michael T.
• Friedrich, Craig
• Society of Photo-optical Instrumentation Engineers
• Semiconductor Equipment and Materials International
• United States. National Institute of Standards and Technology

Bibliographic Information

Microlithography and metrology in micromachining II : 14-15 October, 1996, Austin, Texas

Michael T. Postek, Craig Friedrich, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering, SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Technology

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 2880）

SPIE, 1996

Other Title

Microlithography and metrology in micromachining 2

Note

Includes bibliographic references and index

Details

• NCID: BC06860214
• ISBN:
  • 0819422789
• LCCN: 96069474
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash., USA
• Pages/Volumes: ix, 296 p.
• Size: 28 cm
• Classification:
  • LCC : TJ1191.5
  • DC21 : 621.3815/2
• Subject Headings:
  • LCSH : Micromachining -- Congresses
  • LCSH : Microlithography -- Congresses
  • LCSH : Measurement -- Congresses
• Parent Bibliography ID:
  • BA0022700X