Microlithography and metrology in micromachining II : 14-15 October, 1996, Austin, Texas

著者

• Microlithography and Metrology in Micromachining (Symposium)
• Postek, Michael T.
• Friedrich, Craig
• Society of Photo-optical Instrumentation Engineers
• Semiconductor Equipment and Materials International
• United States. National Institute of Standards and Technology

書誌事項

Microlithography and metrology in micromachining II : 14-15 October, 1996, Austin, Texas

Michael T. Postek, Craig Friedrich, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering, SEMI--Semiconductor Equipment and Materials International, NIST--National Institute of Standards and Technology

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 2880）

SPIE, 1996

タイトル別名

Microlithography and metrology in micromachining 2

注記

Includes bibliographic references and index

詳細情報

• NII書誌ID(NCID): BC06860214
• ISBN:
  • 0819422789
• LCCN: 96069474
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash., USA
• ページ数/冊数: ix, 296 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TJ1191.5
  • DC21 : 621.3815/2
• 件名:
  • LCSH : Micromachining -- Congresses
  • LCSH : Microlithography -- Congresses
  • LCSH : Measurement -- Congresses
• 親書誌ID:
  • BA0022700X