Optical microlithography X : 12-14 March, 1997, Santa Clara, California

著者

• Fuller, Gene E.
• Society of Photo-optical Instrumentation Engineers
• Semiconductor Equipment and Materials International
• SEMATECH (Organization)

書誌事項

Optical microlithography X : 12-14 March, 1997, Santa Clara, California

Gene E. Fuller, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 3051）

SPIE, c1997

タイトル別名

Optical microlithography 10

Optical microlithography ten

注記

Includes bibliographic references and author index

• NII書誌ID(NCID): BC06940776
• ISBN:
  • 081942465X
• LCCN: 98122035
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Washington
• ページ数/冊数: xi, 982 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7835
  • DC21 : 621.3815/31
• 件名:
  • LCSH : Microlithography -- Congresses
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : X-ray lithography -- Congresses
  • LCSH : Manufacturing processes -- Congresses
• 親書誌ID:
  • BA0022700X