{"@context":{"owl":"http://www.w3.org/2002/07/owl#","bibo":"http://purl.org/ontology/bibo/","foaf":"http://xmlns.com/foaf/0.1/","rdfs":"http://www.w3.org/2000/01/rdf-schema#","prism":"http://prismstandard.org/namespaces/basic/2.0/","cinii":"http://ci.nii.ac.jp/ns/1.0/","dc":"http://purl.org/dc/elements/1.1/","dcterms":"http://purl.org/dc/terms/"},"@id":"https://ci.nii.ac.jp/ncid/BC07215069.json","@graph":[{"@id":"https://ci.nii.ac.jp/ncid/BC07215069#entity","@type":"bibo:Book","foaf:isPrimaryTopicOf":{"@id":"https://ci.nii.ac.jp/ncid/BC07215069.json"},"dc:title":[{"@value":"Photomask and X-ray mask technology V : 9-10 April, 1998, Kawasaki, Japan"}],"dcterms:alternative":["Photomask and X-ray mask technology 5"],"dc:creator":"Naoaki Aizaki, editor ; sponsored by Photomask Japan, BACUS, SPIE--The International Society for Optical Engineering ; supporting societies, The Japan Society of Applied Physics ... [et al.] ; published by SPIE--The International Society for Optical Engineering","dc:publisher":[{"@value":"SPIE"}],"dcterms:extent":"xiii, 616 p.","cinii:size":"28 cm","dc:language":"eng","dc:date":"1998","cinii:ncid":"BC07215069","cinii:ownerCount":"1","foaf:maker":[{"@type":"foaf:Person","foaf:name":[{"@value":"Aizaki, Naoaki"}]},{"@type":"foaf:Person","foaf:name":[{"@value":"Photomask Japan"}]},{"@id":"https://ci.nii.ac.jp/author/DA08910530#entity","@type":"foaf:Person","foaf:name":[{"@value":"BACUS (Technical group)"}]},{"@id":"https://ci.nii.ac.jp/author/DA00848546#entity","@type":"foaf:Person","foaf:name":[{"@value":"Society of Photo-optical Instrumentation Engineers"}]}],"bibo:owner":[{"@id":"https://ci.nii.ac.jp/library/FA000106","@type":"foaf:Organization","foaf:name":"東京科学大学 大岡山図書館","rdfs:seeAlso":{"@id":"https://topics.libra.titech.ac.jp/recordID/catalog.bib/BC07215069"}}],"bibo:lccn":["98227293"],"rdfs:seeAlso":[{"@id":"https://lccn.loc.gov/98227293"}],"prism:publicationDate":["c1998"],"cinii:note":["Includes bibliographical references and index"],"dc:subject":["LCC:TK7878","DC21:621.3815/31"],"foaf:topic":[{"@id":"https://ci.nii.ac.jp/books/search?q=Masks+%28Electronics%29+--+Congresses","dc:title":"Masks (Electronics) -- Congresses"},{"@id":"https://ci.nii.ac.jp/books/search?q=Integrated+circuits+--+Masks+--+Congresses","dc:title":"Integrated circuits -- Masks -- Congresses"},{"@id":"https://ci.nii.ac.jp/books/search?q=X-ray+lithography+--+Congresses","dc:title":"X-ray lithography -- Congresses"},{"@id":"https://ci.nii.ac.jp/books/search?q=Microlithography+--+Congresses","dc:title":"Microlithography -- Congresses"}],"dcterms:isPartOf":[{"@id":"https://ci.nii.ac.jp/ncid/BA0022700X#entity","dc:title":"Proceedings / SPIE -- the International Society for Optical Engineering, v. 3412","@type":"bibo:Book"}],"dcterms:hasPart":[{"@id":"urn:isbn:0819428647"}]}]}