Metrology, inspection, and process control for microlithography XV : 26 February-1 March, 2001, Santa Clara, [California] USA

Author(s)

• Sullivan, Neal T.
• Society of Photo-optical Instrumentation Engineers
• Semiconductor Equipment and Materials International
• International SEMATECH

Bibliographic Information

Metrology, inspection, and process control for microlithography XV : 26 February-1 March, 2001, Santa Clara, [California] USA

Neal T. Sullivan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International ; International SEMATECH

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 4344）

SPIE, c2001

Other Title

Metrology, inspection, and process control for microlithography 15

Note

Includes bibliographical references and index

• NCID: BC07734179
• ISBN:
  • 0819440302
• LCCN: 2001279000
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash.
• Pages/Volumes: xxv, 876 p.
• Size: 28 cm
• Classification:
  • LCC : TK7874
  • DC21 : 621.3815/31
• Subject Headings:
  • LCSH : Integrated circuits -- Inspection -- Congresses
  • LCSH : Integrated circuits -- Measurement -- Congresses
  • LCSH : Microlithography -- Congresses
  • LCSH : Process control -- Congresses
• Parent Bibliography ID:
  • BA0022700X