Extreme ultraviolet lithography
著者
書誌事項
Extreme ultraviolet lithography
SPIE, c2020]
大学図書館所蔵 全1件
注記
Includes bibliographical references and index
内容説明・目次
内容説明
This book covers the many aspects of lithographic technology that needed to be addressed in order to make EUV lithography ready for high-volume manufacturing: exposure tools, light sources, masks, resists, process control, metrology, and computational lithography. Lithography costs, which have often influenced the areas of technical focus, are discussed. Potential improvements to current EUV technology and extensions to future nodes are also covered. Each topic is approached from the perspective of a practicing lithographer in a wafer fab, in either manufacturing or development, and there are many references at the end of each chapter.
目次
Introduction
Sources of EUV Light
EUV Exposure Systems
EUV Masks
EUV Resists
Computational Lithography for EUV
Process Control for EUV Lithography
Metrology for EUV Lithography
EUV Lithography Costs
Extending EUV Lithography
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