Extreme ultraviolet lithography
Author(s)
Bibliographic Information
Extreme ultraviolet lithography
SPIE, c2020]
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Note
Includes bibliographical references and index
Description and Table of Contents
Description
This book covers the many aspects of lithographic technology that needed to be addressed in order to make EUV lithography ready for high-volume manufacturing: exposure tools, light sources, masks, resists, process control, metrology, and computational lithography. Lithography costs, which have often influenced the areas of technical focus, are discussed. Potential improvements to current EUV technology and extensions to future nodes are also covered. Each topic is approached from the perspective of a practicing lithographer in a wafer fab, in either manufacturing or development, and there are many references at the end of each chapter.
Table of Contents
Introduction
Sources of EUV Light
EUV Exposure Systems
EUV Masks
EUV Resists
Computational Lithography for EUV
Process Control for EUV Lithography
Metrology for EUV Lithography
EUV Lithography Costs
Extending EUV Lithography
by "Nielsen BookData"
