Epitaxy of semiconductors : physics and fabrication of heterostructures

Author(s)

Bibliographic Information

Epitaxy of semiconductors : physics and fabrication of heterostructures

Udo W. Pohl

(Graduate texts in physics)

Springer, c2020

2nd ed

  • : pbk

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Note

Includes bibliographical references and index

Description and Table of Contents

Description

The extended and revised edition of this textbook provides essential information for a comprehensive upper-level graduate course on the crystalline growth of semiconductor heterostructures. Heteroepitaxy is the basis of today's advanced electronic and optoelectronic devices, and it is considered one of the most important fields in materials research and nanotechnology. The book discusses the structural and electronic properties of strained epitaxial layers, the thermodynamics and kinetics of layer growth, and it describes the major growth techniques: metalorganic vapor-phase epitaxy, molecular-beam epitaxy, and liquid-phase epitaxy. It also examines in detail cubic and hexagonal semiconductors, strain relaxation by misfit dislocations, strain and confinement effects on electronic states, surface structures, and processes during nucleation and growth. Requiring only minimal knowledge of solid-state physics, it provides natural sciences, materials science and electrical engineering students and their lecturers elementary introductions to the theory and practice of epitaxial growth, supported by references and over 300 detailed illustrations. In this second edition, many topics have been extended and treated in more detail, e.g. in situ growth monitoring, application of surfactants, properties of dislocations and defects in organic crystals, and special growth techniques like vapor-liquid-solid growth of nanowires and selective-area epitaxy.

Table of Contents

1 Introduction1.1 Epitaxy1.2 Issues of Epitaxy2 Structural Properties of Heterostructures2.1 Basic Crystal Structures2.2 Elastic Properties of Heterostructures2.3 Dislocations2.4 Defects in Organic Crystals2.5 Structural Characterization using X-ray Diffraction3 Electronic Properties of Heterostructures3.1 Bulk Properties3.2 Band Offsets3.3 Electronic States in Low-Dimensional Structures4 Thermodynamics of Epitaxial Layer-Growth4.1 Phase Equilibria4.2 Crystalline Growth5 Atomistic Aspects of Epitaxial Layer-Growth5.1 Surface Structure5.2 Kinetic Process Steps in Layer Growth5.3 Self-Organized Nanostructures6 In situ Growth Monitoring6.1 Surface Probes6.2 Electron Diffraction Techniques6.3 Optical Techniques7 Application of Surfactants7.1 Surfactant Effect7.2 Surfactant-Assisted Epitaxy8 Doping, Diffusion, and Contacts8.1 Doping of Semiconductors8.2 Diffusion8.3 Metal-Semiconductor Contact9 Methods of Epitaxy9.1 Liquid Phase Epitaxy9.2 Metallorganic Vapor Phase Epitaxy9.3 Molecular Beam Epitaxy10 Special Growth Techniques10.1 Growth of Buffer Layers10.2 Atomic Layer Epitaxy and Related Techniques10.3 Selective-Area Epitaxy10.4 Vapor-Liquid-Solid Growth

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Details

  • NCID
    BC11019723
  • ISBN
    • 9783030438715
  • Country Code
    sz
  • Title Language Code
    eng
  • Text Language Code
    eng
  • Place of Publication
    Cham
  • Pages/Volumes
    xx, 535 p.
  • Size
    25 cm
  • Classification
  • Subject Headings
  • Parent Bibliography ID
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