Advances in chemical mechanical planarization (CMP)

著者

• Babu, Suryadevara

書誌事項

Advances in chemical mechanical planarization (CMP)

Edited by Suryadevara Babu

（Woodhead Publishing series in electronic and optical materials）

Woodhead Pub. is an imprint of Elsevier, c2022

2nd ed

注記

Includes bibliographical references and index

詳細情報

• NII書誌ID(NCID): BC11630144
• ISBN:
  • 9780128217917
• 出版国コード: uk
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Duxford
• ページ数/冊数: xiii, 632 p.
• 大きさ: 23 cm
• 分類:
  • DC23 : 621.38152
• 件名:
  • LCSH : Chemical mechanical planarization
  • LCSH : Semiconductors -- Materials
• 親書誌ID:
  • BB10852471