Advanced gate stack, source/drain, and channel engineering for si-based CMOS 6 : new materials, processes, and equipment

著者

• Gusev, E. P.

書誌事項

Advanced gate stack, source/drain, and channel engineering for si-based CMOS 6 : new materials, processes, and equipment

editors, E.P. Gusev ... [et al.]

（ECS transactions, v. 28, no.1）

Electrochemical Society, c2010

• : hardcover

詳細情報

• NII書誌ID(NCID): BC12706988
• ISBN:
  • 9781566777919
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Pennington, N.J.
• ページ数/冊数: x, 412 p.
• 大きさ: 23 cm
• 親書誌ID:
  • BA78566502