Instrumentation, metrology, and standards for nanomanufacturing II : 10 August 2008, San Diego, California, USA

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Instrumentation, metrology, and standards for nanomanufacturing II : 10 August 2008, San Diego, California, USA

Michael T. Postek, John A. Allgair, editors ; sponsored and published by SPIE ; cosponsored by NIST--National Institute of Standards and Technology (United States)

(Proceedings / SPIE -- the International Society for Optical Engineering, v. 7042)

SPIE, c2008

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Instrumentation, metrology, and standards for nanomanufacturing 2

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注記

Includes bibliographical references and index

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  • Proceedings

    SPIE -- the International Society for Optical Engineering

    SPIE -- the International Society for Optical Engineering

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