Instrumentation, metrology, and standards for nanomanufacturing II : 10 August 2008, San Diego, California, USA

Author(s)

• Postek, Michael T.
• Allgair, John A. (John Alexander)
• Society of Photo-optical Instrumentation Engineers
• United States. National Institute of Standards and Technology

Bibliographic Information

Instrumentation, metrology, and standards for nanomanufacturing II : 10 August 2008, San Diego, California, USA

Michael T. Postek, John A. Allgair, editors ; sponsored and published by SPIE ; cosponsored by NIST--National Institute of Standards and Technology (United States)

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 7042）

SPIE, c2008

Other Title

Instrumentation, metrology, and standards for nanomanufacturing 2

Note

Includes bibliographical references and index

Details

• NCID: BC16169847
• ISBN:
  • 9780819472625
• LCCN: 2010455186
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash.
• Pages/Volumes: 1 v. (various pagings)
• Size: 28 cm
• Classification:
  • LCC : TA418.9.N35
  • DC22 : 620/.5
• Subject Headings:
  • LCSH : Nanostructured materials -- Congresses
  • LCSH : Microfabrication -- Congresses
  • LCSH : Nanomanufacturing -- Congresses
• Parent Bibliography ID:
  • BA0022700X