Photon sources for lithography and metrology

著者

    • Bakshi, Vivek

書誌事項

Photon sources for lithography and metrology

Vivek Bakshi, editor.

SPIE Press, c2023

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注記

Includes bibliographical references and index

収録内容

  • Photon source technology for lithography and metrology : an overview / Vivek Bakshi
  • Laser-produced plasma sources for short-wavelength applications including lithography and microscopy / Gerry O'Sullivan, Padraig Dunne, Takeshi Higashiguchi, Takanori Miyazaki, Fergal O'Reilly, and Emma Sokell
  • Radiation-hydrodynamics modeling of LPP EUV sources / Howard Scott, Steve Langer, and Yechiel Frank
  • Atomic origins of EUV light / John Sheil, James Colgan, and Oscar Versolato
  • Radiation-dominated plasma in LPP sources : physical aspects and challenges for numerical modeling / Mikhail M. Basko
  • EUV sources for high-volume manufacturing / Igor Fomenko, David C. Brandt, Alexander I. Ershov, Alexander A. Schafgans, Yezheng Tao, Georgiy O. Vaschenko, and Bruno La Fontaine
  • EUV light source for lithography / Hakaru Mizoguchi, Shinji Nagai, Takashi Suganuma, Georg Soumagne, Hiroaki Nakarai, Yoshufumi Ueno, Takashi Saitou, and Tatsuya Yanagida
  • The electrodeless Z-pinch metrology source / Stephen Horne, Deborah Gustafson, Matthew J. Partlow, Wolfram Neff, Michael Roderick, and Kosuke Saito
  • High-brightness laser-assisted discharge-produced plasma EUV source for mask inspection and exposure applications / Yusuke Teramoto
  • Compact EUV sources for metrology and irradiation experiments / Klaus Bergmann, Jochen Vieker, Alexander von Wezyk, and Florian Melsheimer
  • The EUV lamp : a discharge-produced metrology EUV source / Rainer Lebert, Christoph Phiesel, Thomas Missalla, and Andreas Biermanns-Föth
  • Laser-driven plasma source technology and applications / Huiling Zhu, Toru Fujinami, Xiaohua Ye, Don McDaniel, and Deborah Gustafson
  • EUV source metrology / Muharrem Bayraktar, Fei Liu, Oscar Versolato, and Fred Bijkerk
  • Collector optics for EUV sources / Sascha Migura, Tobias Müller, and Frank Hartung
  • Grazing incidence optics and applications / Ladislav Pína
  • Materials processing with focused EUV/soft-X-ray pulses / Kazuyuki Sakaue
  • Irreversible changes in materials exposed to EUV radiation / Libor Juha
  • Interaction of intense EUV pulses with atomic and molecular gases / Andrzej Bartnik
  • Plasma diagnostics / Kentaro Tomita
  • Synchrotron-based metrology tools for EUV lithography / Charles Tarrio, Robert E. Vest, Frank Scholze, Michael Kolbe, and Yasin Ekinchi
  • Tin mitigation in EUV sources / Gianluca Panici and David N. Ruzic
  • Compact, efficient CO2 amplifiers with modular design for high-efficiency EUV power generation / Koji Yasui, Junichi Nishimae, Tatsuya Yamamoto, and Yuzuru Tadokoro
  • Excimer lasers for lithography / Hakaru Mizoguchi, Osamu Wakabayashi, Toshihiro Oga, Hiroaki Nakarai, Hiroshi Komori, Kouji Kakizaki, and Junichi Fujimoto
  • Coherent EUV light sources based on high-order harmonic generation sources : principles and applications in nanotechnology / Henry Kapteyn, Margaret M. Murnane, Yuka Esashi, Michael Tanksalvala, Joshua L. Knobloch, Chen-Ting Liao, Daniel D. Hickstein, Clayton Bargsten, Kevin Dorney, and John Petersen
  • YAG lasers for lithography and metrology / Martin Smrž, Jiří Mužik, and Siva Sankar Nagisetty
  • Solid state 2-[mu]m laser drivers for EUV lithography / Brendan A. Reagan, Thomas Galvin, Issa Tamer, Emily Sistrunk, Thomas Spinka, and Craig W. Siders
  • Accelerators and compact storage rings for lithography and metrology / Yasin Ekinci, Terence Garvey, Andreas Streun, and Leonid Rivkin
  • High-power light source for EUV lithography based on the energy-recovery linac free-electron laser / Hiroshi Kawata, Ryuokou Kato, Hiroshi Sakai, Norio Nakamura, and Ryoichi Hajima
  • UV lamps for lithography / Hisakazu Ieuji

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