{"@context":{"owl":"http://www.w3.org/2002/07/owl#","bibo":"http://purl.org/ontology/bibo/","foaf":"http://xmlns.com/foaf/0.1/","rdfs":"http://www.w3.org/2000/01/rdf-schema#","prism":"http://prismstandard.org/namespaces/basic/2.0/","cinii":"http://ci.nii.ac.jp/ns/1.0/","dc":"http://purl.org/dc/elements/1.1/","dcterms":"http://purl.org/dc/terms/"},"@id":"https://ci.nii.ac.jp/ncid/BD14480136.json","@graph":[{"@id":"https://ci.nii.ac.jp/ncid/BD14480136#entity","@type":"bibo:Book","foaf:isPrimaryTopicOf":{"@id":"https://ci.nii.ac.jp/ncid/BD14480136.json"},"dc:title":[{"@value":"Introduction to particle technology"}],"dc:creator":"Martin Rhodes,  Jonathan Seville","dc:publisher":[{"@value":"John Wiley & Sons"}],"dcterms:extent":"476 pages","cinii:size":"26 cm","dc:language":"eng","dc:date":"2024","cinii:ncid":"BD14480136","prism:edition":"3rd edition","cinii:ownerCount":"1","foaf:maker":[{"@id":"https://ci.nii.ac.jp/author/DA04412203#entity","@type":"foaf:Person","foaf:name":[{"@value":"Rhodes, M. J."}]},{"@id":"https://ci.nii.ac.jp/author/DA10755656#entity","@type":"foaf:Person","foaf:name":[{"@value":"Seville, J. P. K. (Jonathan P. K.)"}]}],"bibo:owner":[{"@id":"https://ci.nii.ac.jp/library/FA001415","@type":"foaf:Organization","foaf:name":"東北大学 附属図書館 工学分館","rdfs:seeAlso":{"@id":"https://opac.library.tohoku.ac.jp/opac/opac_openurl/?ncid=BD14480136"}}],"bibo:lccn":["2024005304"],"rdfs:seeAlso":[{"@id":"https://lccn.loc.gov/2024005304"}],"prism:publicationDate":["2024"],"cinii:note":["Content Type: text (ncrcontent), Media Type: unmediated (ncrmedia), Carrier Type: volume (ncrcarrier)","Includes bibliographical refarences (p. [461]-467)and index"],"dc:subject":["LCC:TP156.P3","DC23:620/.43","DC23:620.43"],"foaf:topic":[{"@id":"https://ci.nii.ac.jp/books/search?q=Particles","dc:title":"Particles"},{"@id":"https://ci.nii.ac.jp/books/search?q=Surface+chemistry","dc:title":"Surface chemistry"}],"dcterms:hasPart":[{"@id":"urn:isbn:9781119931102","dc:title":"parperback"}]}]}