{"@context":{"owl":"http://www.w3.org/2002/07/owl#","bibo":"http://purl.org/ontology/bibo/","foaf":"http://xmlns.com/foaf/0.1/","rdfs":"http://www.w3.org/2000/01/rdf-schema#","prism":"http://prismstandard.org/namespaces/basic/2.0/","cinii":"http://ci.nii.ac.jp/ns/1.0/","dc":"http://purl.org/dc/elements/1.1/","dcterms":"http://purl.org/dc/terms/"},"@id":"https://ci.nii.ac.jp/ncid/BD19688950.json","@graph":[{"@id":"https://ci.nii.ac.jp/ncid/BD19688950#entity","@type":"bibo:Book","foaf:isPrimaryTopicOf":{"@id":"https://ci.nii.ac.jp/ncid/BD19688950.json"},"dc:title":[{"@value":"Applied charged particle optics"}],"dc:creator":"edited by Martin Hÿtch","dc:publisher":[{"@value":"Academic Press, an imprint of Elsevier"},{"cinii:publisherRole":"copyright_notice_date"}],"dcterms:extent":"xii, 239 pages","cinii:size":"24 cm","dc:language":"eng","dc:date":"2026","cinii:ncid":"BD19688950","cinii:ownerCount":"2","foaf:maker":[{"@type":"foaf:Person","foaf:name":[{"@value":"Hÿtch, Martin"}]}],"bibo:owner":[{"@id":"https://ci.nii.ac.jp/library/FA012069","@type":"foaf:Organization","foaf:name":"東京大学 先端科学技術研究センター 図書室","rdfs:seeAlso":{"@id":"https://opac.dl.itc.u-tokyo.ac.jp/opac/opac_openurl/?ncid=BD19688950"}},{"@id":"https://ci.nii.ac.jp/library/FA006066","@type":"foaf:Organization","foaf:name":"東京電機大学 総合メディアセンター 千住センター"}],"prism:publicationDate":["[2026]","c2026"],"cinii:note":["Content Type: text (ncrcontent), Media Type: unmediated (ncrmedia), Carrier Type: volume (ncrcarrier)","Includes bibliographical references and index"],"dc:subject":["DC23:537.56"],"foaf:topic":[{"@id":"https://ci.nii.ac.jp/books/search?q=Electron+optics","dc:title":"Electron optics"}],"dcterms:isPartOf":[{"@id":"https://ci.nii.ac.jp/ncid/BC03122013#entity","dc:title":"Advances in imaging and electron physics, volume 239","@type":"bibo:Book"}],"dcterms:hasPart":[{"@id":"urn:isbn:9780443471124","dc:title":"Part 2"}]}]}