CiNii Articles - Nishimura Yukio

1

シリコン基板上の堆積膜の赤外反射吸収スペクトルに対するシリコン酸化膜の影響 [in Japanese]

辻剛志 , 西岡研一 , 西村幸雄 [他] , 辻正治

Journal of the Spectroscopical Society of Japan 51(2), 74-76, 2002-04-15

J-STAGE References (10)
2

Fluorescence Dip Spectra of 5-Phenyltropolone : Investigation of the Potential Energy Surface for the Intramolecular Proton Transfer [in Japanese]

TSUJI Takeshi , HAYASHI Yoshiyuki , HAMABE Hidenori , SEKIYA Hiroshi , MORI Akira , NISHIMURA Yukio , TSUJI Masaharu

Fluorescence dip spectra of 5-phenyltropolone (5PTR) were measured to investigate intramolecular proton transfer. Some transitions, which have not been observed in the fluorescence excitation spectra, …

The Reports of Institute of Advanced Material Study,Kyushu University 15(1), 37-42, 2001

IR DOI
3

Following the Track of the Study in IAMS [in Japanese]

NISHIMURA Yukio

The paper reviews the elementary chemical processes occurring in low-temperature plasma, the proton tunneling of tropolones and in their cluster, and the thin-film deposition by laser processing, whic …

The Reports of Institute of Advanced Material Study,Kyushu University 15(1), 1-9, 2001

IR DOI
4

Chemical Dry Etching of Silicon by Discharge Flow of Ar/CF4 Gas Mixtures : Identification of Ar Active Species Responsible for the Formation of Etchant [in Japanese]

Tanaka Atsushi , Okano Shinji , Tsuji Masaharu , Nishimura Yukio

Chemical dry etching of Si by Ar/CF$_4$ gas mixtures has been studied using a discharge-flow apparatus. Active species of Ar generated by a microwave discharge of Ar/CF$_4$ mixtures are ${\rm Ar}({}^3 …

Engineering sciences reports, Kyushu University 22(3), 267-271, 2000-12

IR DOI
5

Development of a Flow Apparatus of Active Nitrogen for the Use of Nitridation of Silicon Surface [in Japanese]

TSUJI Masaharu , HAMAGAMI Taro , TANAKA Atsushi , NAKANO Kousuke , NISHIMURA Yukio

A fast discharge-flow type active nitrogen source has been developed for the direct nitridation of a Si substrate. A low-power microwave discharge of He/N_2 mixtures was found to supply more active ni …

The Reports of Institute of Advanced Material Study,Kyushu University 14(1), 11-15, 2000-07

IR DOI
6

Analysis of Phase Transition Temperatures of Liquid Crystals by Light Scattering Method (I). [in Japanese]

TSUJI Takeshi , KUBO Kanji , NISHIMURA Yukio , MORI Akira

We have developed a simple analytical system using light scattering method for rapid measurements of phase transition temperature of liquid crystals (LC). Extinction of transmitted laser light due to …

Proceedings of Japanese Liquid Crystal Society Annual meeting 2000(0), 183-184, 2000

J-STAGE
7

Study on Ionization and Dissociation Processes of Plasma Processing Gases Using a Thermal-Energy Ion-Beam Method [in Japanese]

TSUJI Masaharu , NISHIMURA Yukio

A new type of thermal-energy ion-beam apparatus has been constructed and applied to the study on ionization and dissociation processes of plasma processing gases. The total reaction rate constants and …

The Reports of Institute of Advanced Material Study,Kyushu University 11(2), 159-168, 1997-12

IR DOI
8

Development of Discharge-Flow Type of Chemical Dry Etching Apparatus [in Japanese]

Tsuji Masaharu , Nishimura Yukio

A discharge-flow type of chemical dry etching apparatus was developed in order to study the etching processes of Si(1,0,0) and SiO_2 substrates at a room temperature. No etching of Si and SiO_2 substr …

The Reports of Institute of Advanced Material Study,Kyushu University 11(1), 17-21, 1997

IR DOI
9

Multidimensional Proton Tunneling in Jet-Cooled Organic Molecules [in Japanese]

SEKIYA Hiroshi , NISHIMURA Yukio

Journal of the Spectroscopical Society of Japan 44(6), 301-314, 1995-12-15

J-STAGE References (61)
10

Generation of Pulsed Radical Beams and Their Spectroscopic Observation [in Japanese]

NISHIMURA Yukio , NAKANO Naohiko , UJITA Hiroki , SEKIYA Hiroshi

Pulsed radical beam apparatus has been constructed. Diatomic radicals have been studied by using laser-induced fluorescence and multiphoton ionization methods. Rotatinally-cooled radical beams were fo …

The Reports of Institute of Advanced Material Study,Kyushu University 8(1), p35-40, 1994

IR DOI
11

超音速ジェット-レ-ザ分光法によるトロポロン類の分子内水素結合に関する研究 [in Japanese]

西村幸雄 , 関谷博

Reports of the Asahi Glass Foundation (58), p325-335, 1991
12

レ-ザ-による反応生成物の内部状態分布の解析と気相2分子反応のダイナミックス (レ-ザ-の化学への応用<特集>) [in Japanese]

西村幸雄 , 関谷博

The Review of laser engineering 18(4), p250-260, 1990-04
13

Photo-induced intramolecular proton transfer and its application [in Japanese]

NISHIMURA Yukio , SEKIYA Hiroshi

Photo-induced proton transfer in tropolones has been undertaken to obtain information on the fundamentals and development of hydrogen-transfer laser and molecular memory. High resolution spectra in wh …

The Reports of Institute of Advanced Material Study,Kyushu University 4(2), p97-105, 1990

IR DOI
14

Dissociation of the group IV compounds by collisions with metastable rare-gas atoms [in Japanese]

NISHIMURA Yukio , TSUJI Masaharu , SEKIYA Hiroshi

The reactions of rare-gas metastables are of considerable interest because of importance in the plasma chemical vapor deposition as well reaction dynamics. Exit channles and their cross sections have …

The Reports of Institute of Advanced Material Study,Kyushu University 4(2), p89-96, 1990

IR DOI
15

Ar(3P2,0)とCH3X(X=Cl,Br,I),SiH4,Si2H6との解離性励起移動におけるCH,SiHラジカルのレ-ザ-誘起蛍光法による検出 (不安定化学種の構造と反応<特集>) -- (気相) [in Japanese]

関谷博 , 尾場瀬宏 , 西村幸雄

Journal of the Chemical Society of Japan,chemistry and industrial chemistry 1989(8), p1210-1216, 1989-08
16

非平衡プラズマによる分子の励起・解離過程と分子イオンのスペクトル [in Japanese]

西村幸雄

The Reports of research Institute of Industrial Science,Kyushu University (80), p111-122, 1986-03
17

放電アフタ-グロ-中における反応 [in Japanese]

西村幸雄

Journal of High Temperature Society. 8(4), p128-137, 1982
18

プロ-ブによる急冷効果に関する研究-2- (江淵藤彦博士記念号) [in Japanese]

西村幸雄 , 竹之内武義

The Reports of research Institute of Industrial Science,Kyushu University (62), p131-135, 1975-10

西村幸雄 Nishimura Yukio

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西村 幸雄 Nishimura Yukio

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西村幸雄 Nishimura Yukio

Articles:　 1-18 of 18