芦田 裕 ASHIDA Hiroshi

ID:9000000677538

Fujitsu Limited (1993年 CiNii収録論文より)

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  • Outgassing Properties of CVD-SiO_2 Films  [in Japanese]

    ASHIDA Hiroshi , KATO Takashi , ISHIMARU Yoshihiro , FURUMURA Yuji , HORIKAWA Hajime

    We studied the outgassing properties of CVD-SiO<SUB>2</SUB> films using the throughput method. NSG (nondoped silicate glass) films and PSG (phosphosilicate glass) films with 3.2 to 12.0 wt …

    Shinku 36(1), 18-25, 1993-01-20

    J-STAGE  References (10)

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