Department of Physical Electronics, Tokyo Institute of Technology (1998年 CiNii収録論文より)

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  • Excimer-Laser-Induced Lateral-Growth of Silicon Thin-Films

    ISHIKAWA Kensuke , OZAWA Motohiro , OH Chang-Ho , MATSUMURA Masakiyo

    A new excimer-laser crystallization method called the “gradient method”, has been developed for large-grain growth of Si thin-films on glass. The method is based on a spatial modulation of …

    Japanese Journal of Applied Physics 37(3), 731-736, 1998-03-01

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