Department of Chemistry, Graduate School of Science, Kyoto University (2002年 CiNii収録論文より)

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  • A Metastable Precursor in the Oxidation of Si (111)-(7x7)

    OKUYAMA Hiroshi , MIKI Takashi , ARUGA Tetsuya , NISHIJIMA Mitsuaki

    We have studied the initial adsorption of O<FONT SIZE="-1"><SUB>2</SUB></FONT> on Si(111) at 78 K using scanning tunneling microscope (STM). The dominant products at 78 K appea …

    Japanese Journal of Applied Physics 41(12), L1419-L1421, 2002-12-15

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