Department of Materials Science and Engineering, Tokyo Institute of Technology (2006年 CiNii収録論文より)

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  • Study of Self-Diffusion in Silicon at High Pressure

    VAN HUNG Vu , LEE Jaichan , MASUDA JINDO K. , HONG P. T. T.

    The process of self-diffusion in semiconductors at high pressure is studied using the statistical moment method including the anharmonicity effects of the lattice vibration. The activation energy, < …

    Journal of the Physical Society of Japan 75(2), "24601-1"-"24601-7", 2006-02-15

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