Aritome Hiroaki


Faculty of Engineering Science, Osaka University (1981年 CiNii収録論文より)

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  • Reactive Ion-Beam Etching of Silicon Carbide

    Matsui Shinji , Mizuki Sin'ya , Yamato Toshiya , Aritome Hiroaki , Namba Susumu

    A reactive ion-beam etching technique using freon gas is developed for microfabrication in SiC. The enhancement of the etching rate of SiC is apparent by admixing O<SUB>2</SUB> gas in CF&l …

    Japanese Journal of Applied Physics 20(1), L38-L40, 1981


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