TAKECHI SATOSHI

ID:9000253032227

Fujistu Limited 1015 Kamikodanaka (1995年 CiNii収録論文より)

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  • Study of ArF resist material in terms of transparency and dry etch resistance.

    ABE NAOMICHI , TAKECHI SATOSHI , KAIMOTO YUKO , TAKAHASHI MAKOTO , NOZAKI KOJI

    We investigated the etch rates of various polymers etch rates, and found that alicyclic polymers show a good dry etch resistance in spite of the lack of the aromatic rings. On the basis of this findin …

    Journal of Photopolymer Science and Technology 8(4), 637-642, 1995

    J-STAGE 

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