KUROSAKI Toshikazu


Department of Industrial Chemistry, Faculty of Engineering Tokyo Institute of Polytechnics (1996年 CiNii収録論文より)

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  • Photosensitive Polyimides with 2-Nitro-p-xylylene Structure.

    FENG Ke , MATSUMOTO Toshihiko , KUROSAKI Toshikazu

    Several newly developed photosensitive polyimides derived from 2-nitro- <i>p</i>-xylyleneoxyamine <b>a</b> are described. These fully imidized photoresists exhibit both positiv …

    Journal of Photopolymer Science and Technology 9(2), 347-354, 1996


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