村原 正隆 MURAHARA Masataka

ID:9000253689898

東海大学工学部 Faculty of Engineering, Tokai University (1988年 CiNii収録論文より)

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  • Deposition of crystalline silicon films using excimer laser.  [in Japanese]

    MURAHARA Masataka , TAKAHASHI Nozomu , TOYODA Koichi , NAMBA Susumu

    Single crystalline silicon films were grown on the polycrystalline silicon substrate at 450°C substrate temperature using an ArF excimer laser. Laser beams were irradiated simultaneously parallel …

    The Review of Laser Engineering 16(2), 75-81, 1988

    J-STAGE 

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