Kojima Yoshiki


Optoelectronic & Microwave Devices Laboratory, Mitsubishi Electric Corp., 4–1 Mizuhara, Itami, Hyogo 664, Japan (1995年 CiNii収録論文より)

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Articles:  1-1 of 1

  • Effect of Lens Aberration on Resist Pattern Profiles in Edge-Line Phase-Shift Method.

    Nakatani Mitsunori , Kojima Yoshiki , Nakano Hirofumi , Kamon Kazuya , Sato Kazuhiko , Takano Hirozou , Ishihara Osamu

    In edge-line phase-shift lithography, asymmetrical resist patterns formed by both sides of shifter edges have been observed in the case of a narrow shifter. The effect of phase error, shifter width an …

    Japanese Journal of Applied Physics 34(9A), 5043-5048, 1995


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