Saito Kenichi

ID:9000258149544

NTT Telecommunications Energy Laboratories, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan (2000年 CiNii収録論文より)

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Articles:  1-1 of 1

  • Critical-Dimension Controllability of Chemically Amplified Resists for X-Ray Membrane Mask Fabrication.

    Ezaki Mizunori , Saito Kenichi , Matsuda Tadahito , Nakayama Yoshinori , Kikuchi Yukiko , Tsuboi Shinji , Watanabe Hiroshi , Aoyama Hajime , Matsui Yasuji , Morosawa Tetsuo , Ohki Shigehisa

    The key issues in highly precise X-ray mask fabrication are the high-performance electron beam writer and the mask process on a thin membrane. By the combination of 100 kV electron beam system EB-X3 a …

    Japanese Journal of Applied Physics 39(12B), 6908-6913, 2000

    J-STAGE 

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