Kitano Masafumi

ID:9000258180559

University of Tohoku, New Industry Creation Hatchery Center (NICHe) (2005年 CiNii収録論文より)

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  • Adsorption Behavior of Various Fluorocarbon Gases on Silicon Wafer Surface

    Hidaka Atsushi , Ohmi Tadahiro , Yamashita Satoru , Ishii Hidekazu , Kato Takeyoshi , Tanahashi Naoki , Kitano Masafumi , Goto Tetsuya , Teramoto Akinobu , Shirai Yasuyuki

    An analytical technique to clarifying the adsorption behavior of a fluorocarbon gas, which is one of the key steps in reactive ion etching, has been established. In this paper, we focus on the adsorpt …

    Japanese Journal of Applied Physics 44(4B), 2245-2251, 2005

    J-STAGE 

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