Suzuki Masato


R&D Lithography, IC Materials Unit, Merck Performance Materials Manufacturing G.K (2015年 CiNii収録論文より)


論文一覧:  1件中 1-1 を表示

  • Effective EUV Resist Outgassing Barrier Using a Novel Top Coat Material

    Wang Xiaowei , Pawlowski Georg , Okayasu Tetsuo [他] , Suzuki Masato , Hama Yusuke , Watanabe Takeo , Harada Tetsuo , Kinoshita Hiroo

    The contamination of the EUV optics by resist fragments generated during exposure under high volume manufacturing conditions is a serious threat to the lifetime of the EUV exposure tools. The photon e …

    Journal of Photopolymer Science and Technology 28(1), 111-117, 2015