Kinoshita Hiroo


Center for EUVL, Univ. of Hyogo (2015年 CiNii収録論文より)


論文一覧:  1件中 1-1 を表示

  • Recent Progress in EUV Resist Outgas Research at EIDEC

    Shiobara Eishi , Takagi Isamu , Kikuchti Yukiko [他] , Sasami Takeshi , Minegishi Shinya , Fujimori Toru , Watanabe Takeo , Harada Tetsuo , Kinoshita Hiroo , Inoue Soichi

    The suppression of extreme ultraviolet (EUV) resist outgassing is one of the challenges in high-volume manufacturing with EUV lithography (EUVL), because it contributes to the contamination of the EUV …

    Journal of Photopolymer Science and Technology 28(1), 103-110, 2015