Heilman Drew L.

ID:9000300213217

McKetta Department of Chemical Engineering, The University of Texas at Austin (2015年 CiNii収録論文より)

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  • Surface Tension Driven Flow in a Low Molecular Weight Photopolymer

    Kim Chae Bin , Zhou Sunshine X. , Heilman Drew L. [他] , Janes Dustin W. , Ellsion Christopher J.

    Low molecular weight photopolymers are candidate materials for resists in Extreme Ultraviolet Lithography. The patterned chemical transformations used in photolithography generate a surface energy pat …

    Journal of Photopolymer Science and Technology 28(1), 67-71, 2015

    J-STAGE

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