Kamon Kazuya

Articles:  1-1 of 1

  • Photolithography System Using a Combination of Modified Illumination and Phase Shift Mask

    Kamon Kazuya , Miyamoto Teruo , Myoi Yasuhito , Nagata Hitoshi , Kotani Norihiko , Tanaka Masaaki

    Various methods have been developed to overcome the limitations in photolithography. Modified illumination and phase shift mask technologies have been developed in order to improve the depth of focus …

    Japanese Journal of Applied Physics 31pt1(12B), 4131-4136, 1992

    Cited by (2)

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