Oishi Toshiyuki

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  • Effect of Ethane Addition to Argon in Etching of BiSrCaCuO Superconducting Thin Films

    Oishi Toshiyuki , Takami Tetsuya , Kojima Kazuyoshi , Kuroda Ken’ichi , Wada Osamu

    Addition of ethane to argon is found to be very useful in the dry etching of BiSrCaCuO superconducting thin films. BiSrCaCuO thin films are selectively etched with 2.4–20% ethane ratio, because …

    Japanese Journal of Applied Physics 32pt2(2A), L187-L189, 1993

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