Fujita Mitsuhiro


Research & Development management headquarters, Analysis Technology Center, FUJIFILM Corporation (2018年 CiNii収録論文より)

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  • Challenges and Progress in Defectivity for Advanced ArF Lithography Process

    Tango Naohiro , Takahashi Hidenori , Marumo Kazuhiro , Yamamoto Kei , O Keiyu , Shibuya Akinori , Takada Akira , Fujita Mitsuhiro , Fujimori Toru

    The contentious issue in ArF lithography is to reduce cost with multi-patterning process. To achieve low defectivity is required at high speed scanner for increasing throughput. Especially, demand of …

    Journal of Photopolymer Science and Technology 31(4), 555-558, 2018


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